Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
2150-5551
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films ; volume:9 ; number:3 ; day:14 ; month:2 ; year:2017 ; pages:1-8 ; date:7.2017
Nano-Micro letters ; 9, Heft 3 (14.2.2017), 1-8, 7.2017

Classification
Physik

Creator
Zhang, Dainan
Contributor
Wen, Tianlong
Xiong, Ying
Qiu, Donghong
Wen, Qiye
SpringerLink (Online service)

DOI
10.1007/s40820-017-0132-x
URN
urn:nbn:de:1111-201703086552
Rights
Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 10:51 AM CEST

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Associated

  • Zhang, Dainan
  • Wen, Tianlong
  • Xiong, Ying
  • Qiu, Donghong
  • Wen, Qiye
  • SpringerLink (Online service)

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