Structural Properties Characterized by the Film Thickness and Annealing Temperature for La2O3 Films Grown by Atomic Layer Deposition
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1556-276X
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
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Structural Properties Characterized by the Film Thickness and Annealing Temperature for La2O3 Films Grown by Atomic Layer Deposition ; volume:12 ; number:1 ; day:29 ; month:3 ; year:2017 ; pages:1-7 ; date:12.2017
Nanoscale research letters ; 12, Heft 1 (29.3.2017), 1-7, 12.2017
- Classification
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Physik
- Creator
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Wang, Xing
- Contributor
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Liu, Hongxia
Zhao, Lu
Fei, Chenxi
Feng, Xingyao
Chen, Shupeng
Wang, Yongte
SpringerLink (Online service)
- DOI
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10.1186/s11671-017-2018-8
- URN
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urn:nbn:de:1111-2017041614273
- Rights
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:24 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Wang, Xing
- Liu, Hongxia
- Zhao, Lu
- Fei, Chenxi
- Feng, Xingyao
- Chen, Shupeng
- Wang, Yongte
- SpringerLink (Online service)