Structural Properties Characterized by the Film Thickness and Annealing Temperature for La2O3 Films Grown by Atomic Layer Deposition

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
1556-276X
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
Structural Properties Characterized by the Film Thickness and Annealing Temperature for La2O3 Films Grown by Atomic Layer Deposition ; volume:12 ; number:1 ; day:29 ; month:3 ; year:2017 ; pages:1-7 ; date:12.2017
Nanoscale research letters ; 12, Heft 1 (29.3.2017), 1-7, 12.2017

Classification
Physik

Creator
Wang, Xing
Contributor
Liu, Hongxia
Zhao, Lu
Fei, Chenxi
Feng, Xingyao
Chen, Shupeng
Wang, Yongte
SpringerLink (Online service)

DOI
10.1186/s11671-017-2018-8
URN
urn:nbn:de:1111-2017041614273
Rights
Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:24 AM CEST

Data provider

This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.

Associated

  • Wang, Xing
  • Liu, Hongxia
  • Zhao, Lu
  • Fei, Chenxi
  • Feng, Xingyao
  • Chen, Shupeng
  • Wang, Yongte
  • SpringerLink (Online service)

Other Objects (12)