Effects of Annealing Ambient on the Characteristics of LaAlO3 Films Grown by Atomic Layer Deposition
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1556-276X
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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Effects of Annealing Ambient on the Characteristics of LaAlO3 Films Grown by Atomic Layer Deposition ; volume:12 ; number:1 ; day:10 ; month:2 ; year:2017 ; pages:1-7 ; date:12.2017
Nanoscale research letters ; 12, Heft 1 (10.2.2017), 1-7, 12.2017
- Klassifikation
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Physik
- Urheber
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Zhao, Lu
- Beteiligte Personen und Organisationen
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Liu, Hong-Xia
Wang, Xing
Fei, Chen-Xi
Feng, Xing-Yao
Wang, Yong-te
SpringerLink (Online service)
- DOI
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10.1186/s11671-017-1889-z
- URN
-
urn:nbn:de:1111-2017030524060
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 10:59 MESZ
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Beteiligte
- Zhao, Lu
- Liu, Hong-Xia
- Wang, Xing
- Fei, Chen-Xi
- Feng, Xing-Yao
- Wang, Yong-te
- SpringerLink (Online service)
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Impacts of Cu-Doping on the Performance of La-Based RRAM Devices
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Effects of Rapid Thermal Annealing and Different Oxidants on the Properties of LaxAlyO Nanolaminate Films Deposited by Atomic Layer Deposition
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