Hochschulschrift
Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Maße
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21 cm
- Umfang
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138 S.
- Sprache
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Deutsch
- Anmerkungen
-
Ill., graph. Darst.
München, Techn. Univ., Diss., 1993
- Schlagwort
-
Plasmaätzen
Silicium
Einkristall
Epitaxieschicht
Silicium
Disilan
CVD-Verfahren
Silan
- Urheber
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Wang, Chunlin
- Inhaltsverzeichnis
- Rechteinformation
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Letzte Aktualisierung
-
11.06.2025, 13:35 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Objekttyp
- Hochschulschrift
Beteiligte
- Wang, Chunlin
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