Advanced Silicon-on-Insulator: Crystalline Silicon on Atomic Layer Deposited Beryllium Oxide
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2045-2322
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
-
online resource.
- Erschienen in
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Advanced Silicon-on-Insulator: Crystalline Silicon on Atomic Layer Deposited Beryllium Oxide ; volume:7 ; number:1 ; day:16 ; month:10 ; year:2017 ; pages:1-7 ; date:12.2017
Scientific reports ; 7, Heft 1 (16.10.2017), 1-7, 12.2017
- Urheber
-
Min Lee, Seung
Hwan Yum, Jung
Larsen, Eric S.
Chul Lee, Woo
Keun Kim, Seong
Bielawski, Christopher W.
Oh, Jungwoo
- Beteiligte Personen und Organisationen
-
SpringerLink (Online service)
- DOI
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10.1038/s41598-017-13693-6
- URN
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urn:nbn:de:101:1-2019102019412286967927
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:21 MESZ
Datenpartner
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Beteiligte
- Min Lee, Seung
- Hwan Yum, Jung
- Larsen, Eric S.
- Chul Lee, Woo
- Keun Kim, Seong
- Bielawski, Christopher W.
- Oh, Jungwoo
- SpringerLink (Online service)
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