Hochschulschrift
Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Dimensions
-
21 cm
- Extent
-
138 S.
- Language
-
Deutsch
- Notes
-
Ill., graph. Darst.
München, Techn. Univ., Diss., 1993
- Keyword
-
Plasmaätzen
Silicium
Einkristall
Epitaxieschicht
Silicium
Disilan
CVD-Verfahren
Silan
- Creator
-
Wang, Chunlin
- Table of contents
- Rights
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Last update
-
11.06.2025, 1:35 PM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
- Wang, Chunlin
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