Demonstration of Excellent Crystalline Silicon Surface Passivation (S < 1.27 cm s −1) by High‐Rate DC‐Sputtered Hydrogenated Amorphous Silicon

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Demonstration of Excellent Crystalline Silicon Surface Passivation (S < 1.27 cm s −1) by High‐Rate DC‐Sputtered Hydrogenated Amorphous Silicon ; day:27 ; month:02 ; year:2024 ; extent:6
Solar RRL ; (27.02.2024) (gesamt 6)

Creator
Li, Shasha
Miyajima, Shinsuke

DOI
10.1002/solr.202400045
URN
urn:nbn:de:101:1-2024022814083469805676
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 10:46 AM CEST

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Associated

  • Li, Shasha
  • Miyajima, Shinsuke

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