Impact of Laser Treatment on Hydrogenated Amorphous Silicon Properties
Herein, the application of laser radiation to locally modify the hydrogen distribution within hydrogenated amorphous silicon films on a short time scale is studied. The impact of laser power and irradiation time on the temperature of the silicon layer during the laser treatment and the hydrogen outdiffusion is analyzed. Moreover, the resulting optoelectronic properties of the amorphous silicon are examined. On a timescale of a few seconds or less, the hydrogen concentration in the near‐surface region of the silicon layer can be successfully decreased without major impact on the optoelectronic properties.
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Impact of Laser Treatment on Hydrogenated Amorphous Silicon Properties ; volume:22 ; number:6 ; year:2020 ; extent:6
Advanced engineering materials ; 22, Heft 6 (2020) (gesamt 6)
- Urheber
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Maurer, Claudia
Beyer, Wolfhard
Hülsbeck, Markus
Breuer, Uwe
Rau, Uwe
Haas, Stefan
- DOI
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10.1002/adem.201901437
- URN
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urn:nbn:de:101:1-2022061805134078802130
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:28 MESZ
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Beteiligte
- Maurer, Claudia
- Beyer, Wolfhard
- Hülsbeck, Markus
- Breuer, Uwe
- Rau, Uwe
- Haas, Stefan
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