Effective Passivation of Black Silicon Surfaces via Plasma‐Enhanced Chemical Vapor Deposition Grown Conformal Hydrogenated Amorphous Silicon Layer
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Effective Passivation of Black Silicon Surfaces via Plasma‐Enhanced Chemical Vapor Deposition Grown Conformal Hydrogenated Amorphous Silicon Layer ; volume:14 ; number:1 ; year:2020 ; extent:7
Physica status solidi / Rapid research letters. Rapid research letters ; 14, Heft 1 (2020) (gesamt 7)
- Urheber
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Özkol, Engin
Procel, Paul
Zhao, Yifeng
Mazzarella, Luana
Medlin, Rostislav
Šutta, Pavol
Isabella, Olindo
Zeman, Miro
- DOI
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10.1002/pssr.201900087
- URN
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urn:nbn:de:101:1-2022062706550975914283
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:22 MESZ
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Beteiligte
- Özkol, Engin
- Procel, Paul
- Zhao, Yifeng
- Mazzarella, Luana
- Medlin, Rostislav
- Šutta, Pavol
- Isabella, Olindo
- Zeman, Miro
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