Monografie
Study of the N yield in a microwave plasma for the deposition of CNH materials : measurement in the remote plasma, kinetic study and etching of a-C:H films by N atoms
- Language
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Englisch
- Notes
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Bochum, Univ., Diss., 2001
- Identifier
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963172050
Subject
Mikrowellenplasma ; Stickstoffatom ; Quadrupolmassenspektrometrie ; Boltzmann-Gleichung ; Plasmaätzen ; Hochschulschrift; Online-Publikation
Contributor
- URN
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
26.01.2023, 1:55 PM CET
Object type
- Monografie
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