Chemical Vapor Deposition Methods for Preparation of Radioactively Doped Thin Films
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Chemical Vapor Deposition Methods for Preparation of Radioactively Doped Thin Films ; volume:15 ; number:3 ; year:1996 ; pages:159-162
High temperature materials and processes ; 15, Heft 3 (1996), 159-162
- Urheber
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Paz,, M.
Ungerish,, M.
Gardner,, J. A.
Platzer,, R.
- DOI
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10.1515/HTMP.1996.15.3.159
- URN
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urn:nbn:de:101:1-2501260517401.773255782275
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:28 MESZ
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Beteiligte
- Paz,, M.
- Ungerish,, M.
- Gardner,, J. A.
- Platzer,, R.
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