A comprehensive calibration of integrated magnetron sputtering and plasma enhanced chemical vapor deposition for rare-earth doped thin films
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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1 Online-Ressource.
- Sprache
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Englisch
- Erschienen in
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A comprehensive calibration of integrated magnetron sputtering and plasma enhanced chemical vapor deposition for rare-earth doped thin films ; volume:39 ; number:1 ; day:7 ; month:11 ; year:2023 ; pages:150-164 ; date:1.2024
Journal of materials research ; 39, Heft 1 (7.11.2023), 150-164, 1.2024
- Urheber
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Khatami, Zahra
Wolz, Lukas
Wojcik, Jacek
Mascher, Peter
- Beteiligte Personen und Organisationen
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SpringerLink (Online service)
- DOI
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10.1557/s43578-023-01207-2
- URN
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urn:nbn:de:101:1-2024032512492471856991
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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14.08.2025, 10:47 MESZ
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Beteiligte
- Khatami, Zahra
- Wolz, Lukas
- Wojcik, Jacek
- Mascher, Peter
- SpringerLink (Online service)
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