Preparation of rutile TiO2 thin films by laser chemical vapor deposition method
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2227-8508
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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Preparation of rutile TiO2 thin films by laser chemical vapor deposition method ; volume:2 ; number:2 ; day:4 ; month:6 ; year:2013 ; pages:162-166 ; date:6.2013
Journal of advanced ceramics ; 2, Heft 2 (4.6.2013), 162-166, 6.2013
- Urheber
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Guo, Dongyun
- Beteiligte Personen und Organisationen
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Ito, Akihiko
Gotō, Takashi
Tu, Rong
Wang, Chuanbin
Shen, Qiang
Zhang, Lianmeng
SpringerLink (Online service)
- DOI
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10.1007/s40145-013-0056-y
- URN
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urn:nbn:de:1111-2016052317523
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 10:49 MESZ
Datenpartner
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Beteiligte
- Guo, Dongyun
- Ito, Akihiko
- Gotō, Takashi
- Tu, Rong
- Wang, Chuanbin
- Shen, Qiang
- Zhang, Lianmeng
- SpringerLink (Online service)
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