Chemical Vapor Deposition Methods for Preparation of Radioactively Doped Thin Films

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Chemical Vapor Deposition Methods for Preparation of Radioactively Doped Thin Films ; volume:15 ; number:3 ; year:1996 ; pages:159-162
High temperature materials and processes ; 15, Heft 3 (1996), 159-162

Creator
Paz,, M.
Ungerish,, M.
Gardner,, J. A.
Platzer,, R.

DOI
10.1515/HTMP.1996.15.3.159
URN
urn:nbn:de:101:1-2501260517401.773255782275
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:28 AM CEST

Data provider

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Associated

  • Paz,, M.
  • Ungerish,, M.
  • Gardner,, J. A.
  • Platzer,, R.

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