Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
2045-2322
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature ; volume:7 ; number:1 ; day:26 ; month:10 ; year:2017 ; pages:1-8 ; date:12.2017
Scientific reports ; 7, Heft 1 (26.10.2017), 1-8, 12.2017

Creator
Lee, Hyung-Ik
Park, Jong-Bong
Xianyu, Wenxu
Kim, Kihong
Chung, Jae Gwan
Kyoung, Yong Koo
Byun, Sunjung
Yang, Woo Young
Park, Yong Young
Kim, Seong Min
Cho, Eunae
Shin, Jai Kwang
Contributor
SpringerLink (Online service)

DOI
10.1038/s41598-017-14291-2
URN
urn:nbn:de:101:1-2019102020543749310758
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:23 AM CEST

Data provider

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Associated

  • Lee, Hyung-Ik
  • Park, Jong-Bong
  • Xianyu, Wenxu
  • Kim, Kihong
  • Chung, Jae Gwan
  • Kyoung, Yong Koo
  • Byun, Sunjung
  • Yang, Woo Young
  • Park, Yong Young
  • Kim, Seong Min
  • Cho, Eunae
  • Shin, Jai Kwang
  • SpringerLink (Online service)

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