Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2045-2322
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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Degradation by water vapor of hydrogenated amorphous silicon oxynitride films grown at low temperature ; volume:7 ; number:1 ; day:26 ; month:10 ; year:2017 ; pages:1-8 ; date:12.2017
Scientific reports ; 7, Heft 1 (26.10.2017), 1-8, 12.2017
- Urheber
-
Lee, Hyung-Ik
Park, Jong-Bong
Xianyu, Wenxu
Kim, Kihong
Chung, Jae Gwan
Kyoung, Yong Koo
Byun, Sunjung
Yang, Woo Young
Park, Yong Young
Kim, Seong Min
Cho, Eunae
Shin, Jai Kwang
- Beteiligte Personen und Organisationen
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SpringerLink (Online service)
- DOI
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10.1038/s41598-017-14291-2
- URN
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urn:nbn:de:101:1-2019102020543749310758
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:23 MESZ
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Beteiligte
- Lee, Hyung-Ik
- Park, Jong-Bong
- Xianyu, Wenxu
- Kim, Kihong
- Chung, Jae Gwan
- Kyoung, Yong Koo
- Byun, Sunjung
- Yang, Woo Young
- Park, Yong Young
- Kim, Seong Min
- Cho, Eunae
- Shin, Jai Kwang
- SpringerLink (Online service)
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