- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Dimensions
-
30 cm
- Extent
-
XIV, 117 S.
- Language
-
Englisch
- Notes
-
Ill., graph. Darst.
Würzburg, Univ., Diss., 2013 (Nicht für den Austausch)
- Keyword
-
Molekularstrahlepitaxie ; Silicium ; Herstellung ; Halbleiter ; Mangan ; Siliciumdioxid
- Creator
- Table of contents
- Rights
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Last update
-
11.06.2025, 1:36 PM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
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SILICON
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Growth and Characterization of Epitaxial Manganese Silicide Thin Films
Investigation of a Self-Aligned Cobalt Silicide Process for Ohmic Contacts to Silicon Carbide
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SILICON
Silicon Based MBE of Manganese-Silicide and Silicon-Suboxide
Electron microscopy characterization of manganese silicide layers on silicon
Rare earth silicide nanowires on silicon surfaces
Ferro alloy statistics 1975 - 1980, Vol. 1.. Ferro-manganese, silicon-manganese, ferro-silicon, ferro-chromium
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Investigation of a Self-Aligned Cobalt Silicide Process for Ohmic Contacts to Silicon Carbide
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Silicon