Investigation of a Self-Aligned Cobalt Silicide Process for Ohmic Contacts to Silicon Carbide
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1543-186X
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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Investigation of a Self-Aligned Cobalt Silicide Process for Ohmic Contacts to Silicon Carbide ; volume:48 ; number:4 ; day:12 ; month:2 ; year:2019 ; pages:2509-2516 ; date:4.2019
Journal of electronic materials ; 48, Heft 4 (12.2.2019), 2509-2516, 4.2019
- Urheber
-
Ekström, Mattias
Ferrario, Andrea
Zetterling, Carl-Mikael
- Beteiligte Personen und Organisationen
-
SpringerLink (Online service)
- DOI
-
10.1007/s11664-019-07020-0
- URN
-
urn:nbn:de:101:1-2019033104511941924654
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 10:59 MESZ
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Beteiligte
- Ekström, Mattias
- Ferrario, Andrea
- Zetterling, Carl-Mikael
- SpringerLink (Online service)
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