Hochschulschrift
Electron beam induced carbon nanomasking used for selective electrochemical reactions on semiconductor surfaces
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Maße
-
30 cm
- Umfang
-
137 S.
- Sprache
-
Englisch
- Anmerkungen
-
Ill., graph. Darst.
Erlangen, Nürnberg, Univ., Diss., 2002
- Schlagwort
-
Rasterelektronenmikroskop
Elektronenstrahllithografie
CVD-Verfahren
Kohlenstoff
Maskentechnik
Nanostruktur
Rasterelektronenmikroskop ; Elektronenstrahllithographie ; CVD-Verfahren ; Kohlenstoff ; Maskentechnik ; Nanostruktur
- Urheber
- Inhaltsverzeichnis
- Rechteinformation
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Letzte Aktualisierung
-
11.03.2025, 12:02 MEZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Objekttyp
- Hochschulschrift
Beteiligte
Ähnliche Objekte (12)
Electron beam induced carbon nanomasking used for selective electrochemical reactions on semiconductor surfaces
Selective electrochemical functionalization of the graphene edge
Magnetotransport Properties of Ferromagnetic Nanoparticles in a Semiconductor Matrix Studied by Precise Size-Selective Cluster Ion Beam Deposition
Lasing and ion beam doping of semiconductor nanowires
Lasing and ion beam doping of semiconductor nanowires
High-fluence ion beam irradiation of semiconductor nanowires
Local electrochemical formation and selective detection of reactive oxygen species
Isolated Graphene Edge Nanoelectrodes: Fabrication, Selective Functionalization, and Electrochemical Sensing
Characterisation and selective modification of semiconductor nanowires for electrical applications
Characterisation and selective modification of semiconductor nanowires for electrical applications
Fundamental consolidation mechanisms during selective beam melting of powders
Advancement of selective laser melting by laser beam shaping
Electron beam induced carbon nanomasking used for selective electrochemical reactions on semiconductor surfaces
Selective electrochemical functionalization of the graphene edge
Magnetotransport Properties of Ferromagnetic Nanoparticles in a Semiconductor Matrix Studied by Precise Size-Selective Cluster Ion Beam Deposition
Lasing and ion beam doping of semiconductor nanowires
Lasing and ion beam doping of semiconductor nanowires
High-fluence ion beam irradiation of semiconductor nanowires
Local electrochemical formation and selective detection of reactive oxygen species
Isolated Graphene Edge Nanoelectrodes: Fabrication, Selective Functionalization, and Electrochemical Sensing
Characterisation and selective modification of semiconductor nanowires for electrical applications
Characterisation and selective modification of semiconductor nanowires for electrical applications
Fundamental consolidation mechanisms during selective beam melting of powders
Advancement of selective laser melting by laser beam shaping
Electron beam induced carbon nanomasking used for selective electrochemical reactions on semiconductor surfaces
Selective electrochemical functionalization of the graphene edge
Magnetotransport Properties of Ferromagnetic Nanoparticles in a Semiconductor Matrix Studied by Precise Size-Selective Cluster Ion Beam Deposition
Lasing and ion beam doping of semiconductor nanowires
Lasing and ion beam doping of semiconductor nanowires
High-fluence ion beam irradiation of semiconductor nanowires
Local electrochemical formation and selective detection of reactive oxygen species
Isolated Graphene Edge Nanoelectrodes: Fabrication, Selective Functionalization, and Electrochemical Sensing
Characterisation and selective modification of semiconductor nanowires for electrical applications
Characterisation and selective modification of semiconductor nanowires for electrical applications
Fundamental consolidation mechanisms during selective beam melting of powders