Hochschulschrift
Electron beam induced carbon nanomasking used for selective electrochemical reactions on semiconductor surfaces
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
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Englisch
- Anmerkungen
-
Dateien im PDF-Format
Erlangen, Nürnberg, Univ., Diss., 2002
- Klassifikation
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Technische Chemie
- Schlagwort
-
Rasterelektronenmikroskop
Elektronenstrahllithografie
CVD-Verfahren
Kohlenstoff
Maskentechnik
Nanostruktur
Rasterelektronenmikroskop ; Elektronenstrahllithographie ; CVD-Verfahren ; Kohlenstoff ; Maskentechnik ; Nanostruktur
- Urheber
- URN
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urn:nbn:de:bvb:29-opus-348
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:50 MEZ
Datenpartner
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Objekttyp
- Hochschulschrift
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