Hochschulschrift
Electron beam induced carbon nanomasking used for selective electrochemical reactions on semiconductor surfaces
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Dimensions
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30 cm
- Extent
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137 S.
- Language
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Englisch
- Notes
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Ill., graph. Darst.
Erlangen, Nürnberg, Univ., Diss., 2002
- Keyword
-
Rasterelektronenmikroskop
Elektronenstrahllithografie
CVD-Verfahren
Kohlenstoff
Maskentechnik
Nanostruktur
Rasterelektronenmikroskop ; Elektronenstrahllithographie ; CVD-Verfahren ; Kohlenstoff ; Maskentechnik ; Nanostruktur
- Creator
- Table of contents
- Rights
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Last update
-
11.06.2025, 2:30 PM CEST
Data provider
This object is provided by:
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
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Lasing and ion beam doping of semiconductor nanowires
Lasing and ion beam doping of semiconductor nanowires
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Local electrochemical formation and selective detection of reactive oxygen species
Isolated Graphene Edge Nanoelectrodes: Fabrication, Selective Functionalization, and Electrochemical Sensing
Characterisation and selective modification of semiconductor nanowires for electrical applications
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