Hochschulschrift
Effective passivation of black silicon surfaces by conformal thermal ALD deposited Al2O3 layers
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
-
Halle (Saale), Universitäts- und Landesbibliothek Sachsen-Anhalt, Diss., 2015
- Klassifikation
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Physik
- Ereignis
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Veröffentlichung
- (wo)
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Halle, Saale
- (wer)
-
Universitäts- und Landesbibliothek Sachsen-Anhalt
- (wann)
-
2015
- Urheber
-
Otto, Martin
- Beteiligte Personen und Organisationen
-
Wehrspohn, Ralf B.
Scheer, Roland
Knez, Mato
- URN
-
urn:nbn:de:gbv:3:4-14656
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 10:57 MESZ
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Objekttyp
- Hochschulschrift
Beteiligte
- Otto, Martin
- Wehrspohn, Ralf B.
- Scheer, Roland
- Knez, Mato
- Universitäts- und Landesbibliothek Sachsen-Anhalt
Entstanden
- 2015
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Passivation of Si wafers by Al2O3 films with different surface conditioning
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