Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Erschienen in
-
In: Review of Scientific Instruments (86:7) - Melville, NY : American Institute of Physics (AIP) - Art.-Id. 073903
- Ereignis
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Veröffentlichung
- (wo)
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Berlin
- (wer)
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Technische Universität Berlin
- (wann)
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2020
- Urheber
-
Kaganskiy, Arsenty
Gschrey, Manuel
Schlehahn, Alexander
Schmidt, Ronny
Schulze, Jan-Hindrik
Heindel, Tobias
Strittmatter, André
Rodt, Sven
Reitzenstein, Stephan
- DOI
-
10.14279/depositonce-10051
- Handle
-
11303/11160
- URN
-
urn:nbn:de:101:1-2020052002063565968163
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 10:48 MESZ
Datenpartner
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Beteiligte
- Kaganskiy, Arsenty
- Gschrey, Manuel
- Schlehahn, Alexander
- Schmidt, Ronny
- Schulze, Jan-Hindrik
- Heindel, Tobias
- Strittmatter, André
- Rodt, Sven
- Reitzenstein, Stephan
- Technische Universität Berlin
Entstanden
- 2020
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