Hochschulschrift
Metal cluster sputtering under reactive ion bombardment investigated by TOF-SNMS laser system
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Dimensions
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30 cm
- Extent
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134 S.
- Language
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Englisch
- Notes
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graph. Darst.
Duisburg, Essen, Univ., Diss., 2005 (Nicht für den Austausch)
- Keyword
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Metallcluster
Sputtern
Sekundärneutralteilchen-Massenspektrometrie
Flugzeitmassenspektrometrie
Laserionisation
- Creator
- Table of contents
- Rights
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Last update
-
11.06.2025, 1:39 PM CEST
Data provider
This object is provided by:
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
Other Objects (12)
Metal cluster sputtering under reactive ion bombardment investigated by TOF-SNMS-laser-system
Reactive cluster impact dynamics and ion processes investigated by cluster impact mass spectrometry
Reactive cluster impact dynamics and ion processes investigated by cluster impact mass spectrometry
An investigation of target poisoning during reactive magnetron sputtering
An Investigation of Target Poisoning during Reactive Magnetron Sputtering
Functionalization of Ti-40Nb implant material with strontium by reactive sputtering
HOM cluster decomposition in APi-TOF mass spectrometers
Sputtering of silicon nanopowders by an argon cluster ion beam
Sputtering data
Elevating Platinum to Volumetric Capacitance: High Surface Area Electrodes through Reactive Pt Sputtering
High Potential Columnar Nanocrystalline AlN Films Deposited by RF Reactive Magnetron Sputtering
Elevating Platinum to Volumetric Capacitance: High Surface Area Electrodes through Reactive Pt Sputtering
Metal cluster sputtering under reactive ion bombardment investigated by TOF-SNMS-laser-system
Reactive cluster impact dynamics and ion processes investigated by cluster impact mass spectrometry
Reactive cluster impact dynamics and ion processes investigated by cluster impact mass spectrometry
An investigation of target poisoning during reactive magnetron sputtering
An Investigation of Target Poisoning during Reactive Magnetron Sputtering
Functionalization of Ti-40Nb implant material with strontium by reactive sputtering
HOM cluster decomposition in APi-TOF mass spectrometers
Sputtering of silicon nanopowders by an argon cluster ion beam
Sputtering data
Elevating Platinum to Volumetric Capacitance: High Surface Area Electrodes through Reactive Pt Sputtering
High Potential Columnar Nanocrystalline AlN Films Deposited by RF Reactive Magnetron Sputtering
Elevating Platinum to Volumetric Capacitance: High Surface Area Electrodes through Reactive Pt Sputtering
Metal cluster sputtering under reactive ion bombardment investigated by TOF-SNMS-laser-system
Reactive cluster impact dynamics and ion processes investigated by cluster impact mass spectrometry
Reactive cluster impact dynamics and ion processes investigated by cluster impact mass spectrometry
An investigation of target poisoning during reactive magnetron sputtering
An Investigation of Target Poisoning during Reactive Magnetron Sputtering
Functionalization of Ti-40Nb implant material with strontium by reactive sputtering
HOM cluster decomposition in APi-TOF mass spectrometers
Sputtering of silicon nanopowders by an argon cluster ion beam
Sputtering data
Elevating Platinum to Volumetric Capacitance: High Surface Area Electrodes through Reactive Pt Sputtering
High Potential Columnar Nanocrystalline AlN Films Deposited by RF Reactive Magnetron Sputtering