Approaching gas phase electrodeposition: process and optimization to enable the self-aligned growth of 3D nanobridge-based interconnects
- Sprache
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Englisch
- Identifier
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1194063756
Beteiligte Personen und Organisationen
- DOI
-
10.1002/adma.201503039
- URN
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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26.01.2023, 13:53 MEZ
Beteiligte
- Fang, Jun
- Schlag, Leslie
- Park, Se-Chul
- Stauden, Thomas
- Pezoldt, Jörg
- Schaaf, Peter
- Jacobs, Heiko O.
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