Plasma-enhanced atomic layer deposition of silicon nitride for front-end-of-line applications
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
-
Englisch
- Erschienen in
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In: Journal of Vacuum Science & Technology A, 41, 4, S.
- Ereignis
-
Veröffentlichung
- (wo)
-
Wildau
- (wer)
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Technische Hochschule Wildau
- (wann)
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2023
- Urheber
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Lisker, Marco
Kalishettyhalli Mahadevaiah, Mamathamba
Dorai Swamy Reddy, Keerthi
- URN
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urn:nbn:de:kobv:526-opus4-17699
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:54 MEZ
Datenpartner
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Beteiligte
- Lisker, Marco
- Kalishettyhalli Mahadevaiah, Mamathamba
- Dorai Swamy Reddy, Keerthi
- Technische Hochschule Wildau
Entstanden
- 2023
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