- Alternative title
-
Interferenzlithographie mit extrem ultravioletter Strahlung
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Notes
-
RWTH Aachen University und University of Southampton, Dissertation, 2016
- Classification
-
Physik
- Event
-
Veröffentlichung
- (where)
-
Aachen
- (who)
-
Universitätsbibliothek der RWTH Aachen
- (when)
-
2016
- Creator
- Contributor
- URN
-
urn:nbn:de:hbz:82-rwth-2017-028144
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
25.03.2025, 1:41 PM CET
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Kim, Hyun-Su
- Juschkin, Larissa
- Taubner, Thomas Günter
- Universitätsbibliothek der RWTH Aachen
Time of origin
- 2016
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Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Mass Spectrometric Investigation of Metal Hydrides relevant to Extreme Ultraviolet Lithography
Particle emission from extreme ultraviolet light sources
Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas
Terahertz-wave decoding of femtosecond extreme-ultraviolet light pulses
Attosecond transient absorption spectroscopy : controlling extreme ultraviolet light-matter interaction
Studies on laser-triggered discharge plasmas as extreme ultraviolet light sources
Frequency combs in the extreme ultraviolet
Resonant magnetic scattering studies using synchrotron radiation and laser-generated extreme ultraviolet light
Dornier .- Extreme Ultraviolet -Spektrometer (EUV): Bd. 1
Diffraction-based metrology in the extreme ultraviolet
Computational proximity lithography with extreme ultraviolet radiation
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Mass Spectrometric Investigation of Metal Hydrides relevant to Extreme Ultraviolet Lithography
Particle emission from extreme ultraviolet light sources
Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas
Terahertz-wave decoding of femtosecond extreme-ultraviolet light pulses
Attosecond transient absorption spectroscopy : controlling extreme ultraviolet light-matter interaction
Studies on laser-triggered discharge plasmas as extreme ultraviolet light sources
Frequency combs in the extreme ultraviolet
Resonant magnetic scattering studies using synchrotron radiation and laser-generated extreme ultraviolet light
Dornier .- Extreme Ultraviolet -Spektrometer (EUV): Bd. 1