Impacts of Annealing Conditions on the Flat Band Voltage of Alternate La2O3/Al2O3 Multilayer Stack Structures
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1556-276X
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
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Impacts of Annealing Conditions on the Flat Band Voltage of Alternate La2O3/Al2O3 Multilayer Stack Structures ; volume:11 ; number:1 ; day:13 ; month:9 ; year:2016 ; pages:1-6 ; date:12.2016
Nanoscale research letters ; 11, Heft 1 (13.9.2016), 1-6, 12.2016
- Creator
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Feng, Xing-Yao
- Contributor
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Liu, Hong-Xia
Wang, Xing
Zhao, Lu
Fei, Chen-Xi
Liu, He-Lei
SpringerLink (Online service)
- DOI
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10.1186/s11671-016-1623-2
- URN
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urn:nbn:de:1111-20161014646
- Rights
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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14.08.2025, 11:00 AM CEST
Data provider
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Feng, Xing-Yao
- Liu, Hong-Xia
- Wang, Xing
- Zhao, Lu
- Fei, Chen-Xi
- Liu, He-Lei
- SpringerLink (Online service)
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Effects of Rapid Thermal Annealing and Different Oxidants on the Properties of LaxAlyO Nanolaminate Films Deposited by Atomic Layer Deposition
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