Simultaneous large-scale reliability analysis of ultra-thin MOS gate dielectrics using an automated test system
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Erschienen in
-
In: Advances in Radio Science (6): 205-207 (2008)
- Klassifikation
-
Elektrotechnik, Elektronik
- Ereignis
-
Veröffentlichung
- (wo)
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Hamburg
- (wer)
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Universitätsbibliothek der Technischen Universität Hamburg-Harburg
- (wann)
-
2008
- URN
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urn:nbn:de:gbv:830-882.043858
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:46 MEZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Beteiligte
- Domdey, Andreas
- Hafkemeyer, Kristian M.
- Krautschneider, Wolfgang
- Schröder, Dietmar
- Universitätsbibliothek der Technischen Universität Hamburg-Harburg
Entstanden
- 2008
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