Hochschulschrift
Optical and structural properties of Indium-Nitride epilayers and their growth by High-Pressure Chemical Vapor Deposition
- Weitere Titel
-
Optische und strukturelle Eigenschaften von Indiumnitrid Epi-Schichten und deren Wachstum mittels Hochdruck-Gasphasenepitaxy
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Anmerkungen
-
Berlin, Technische Universtität Berlin, Diss., 2012
- Klassifikation
-
Physik
- Ereignis
-
Veröffentlichung
- (wo)
-
Berlin
- (wer)
-
Universitätsbibliothek der Technischen Universität Berlin
- (wann)
-
2013
- Urheber
-
Bügler, Max Johann Ludwig
- Beteiligte Personen und Organisationen
-
Hoffmann, Axel
- URN
-
urn:nbn:de:kobv:83-opus-38999
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:43 MEZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Objekttyp
- Hochschulschrift
Beteiligte
- Bügler, Max Johann Ludwig
- Hoffmann, Axel
- Universitätsbibliothek der Technischen Universität Berlin
Entstanden
- 2013
Ähnliche Objekte (12)
Metal‐lorganic chemical vapor deposition of aluminum scandium nitride
Metal organic chemical vapor deposition of indium oxide for ozone sensing
Metal organic chemical vapor deposition of indium oxide for ozone sensing
Indium gallium nitride nanostructures for optoelectronic applications
Modeling for Chemical Vapor Deposition
Modeling for Chemical Vapor Deposition
Metalorganic chemical vapor deposition (MOCVD) routes for fabrication of rare earth nitride thin films : precursor evaluation, thin film deposition and characterization
Simulation of a Chemical Vapor Deposition
Structural, optical, and mechanical properties of silicon nitride films deposited by inductively coupled plasma enhanced chemical vapor deposition
Modeling and Simulation for Physical Vapor Deposition
Chemical vapor deposition : modeling, simulation and optimization
Synthesis of Thin Films by Chemical Vapor Deposition : Synthesis of thin MoS films with Chemical Vapor Deposition
Metal‐lorganic chemical vapor deposition of aluminum scandium nitride
Metal organic chemical vapor deposition of indium oxide for ozone sensing
Metal organic chemical vapor deposition of indium oxide for ozone sensing
Indium gallium nitride nanostructures for optoelectronic applications
Modeling for Chemical Vapor Deposition
Modeling for Chemical Vapor Deposition
Metalorganic chemical vapor deposition (MOCVD) routes for fabrication of rare earth nitride thin films : precursor evaluation, thin film deposition and characterization
Simulation of a Chemical Vapor Deposition
Structural, optical, and mechanical properties of silicon nitride films deposited by inductively coupled plasma enhanced chemical vapor deposition
Modeling and Simulation for Physical Vapor Deposition
Chemical vapor deposition : modeling, simulation and optimization
Synthesis of Thin Films by Chemical Vapor Deposition : Synthesis of thin MoS films with Chemical Vapor Deposition
Metal‐lorganic chemical vapor deposition of aluminum scandium nitride
Metal organic chemical vapor deposition of indium oxide for ozone sensing
Metal organic chemical vapor deposition of indium oxide for ozone sensing
Indium gallium nitride nanostructures for optoelectronic applications
Modeling for Chemical Vapor Deposition
Modeling for Chemical Vapor Deposition
Metalorganic chemical vapor deposition (MOCVD) routes for fabrication of rare earth nitride thin films : precursor evaluation, thin film deposition and characterization
Simulation of a Chemical Vapor Deposition
Structural, optical, and mechanical properties of silicon nitride films deposited by inductively coupled plasma enhanced chemical vapor deposition
Modeling and Simulation for Physical Vapor Deposition
Chemical vapor deposition : modeling, simulation and optimization