Simultaneous large-scale reliability analysis of ultra-thin MOS gate dielectrics using an automated test system
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Simultaneous large-scale reliability analysis of ultra-thin MOS gate dielectrics using an automated test system ; volume:6 ; year:2008 ; pages:205-207
Advances in radio science ; 6 (2008), 205-207
- Urheber
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Domdey, A.
Hafkemeyer, K. M.
Krautschneider, W. H.
Schroeder, D.
- DOI
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10.5194/ars-6-205-2008
- URN
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urn:nbn:de:101:1-2018010219351
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
- 15.08.2025, 07:26 MESZ
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Beteiligte
- Domdey, A.
- Hafkemeyer, K. M.
- Krautschneider, W. H.
- Schroeder, D.
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