Dental enamel roughness with different acid etching times: Atomic force microscopy study
Abstract: Objective: An important characteristic of human dental enamel not yet studied in detail is its surface roughness in mesoscopic scale. This study evaluated quantitatively and qualitatively the surface topography of acid etched enamel with different etching times. Materials and Methods: Ninety-six human maxillary bicuspids were randomly distributed into three groups (n=32): T0 (control), pumiced; T15, 35% phosphoric acid etched enamel for 15 s; T30, 35% phosphoric acid etched enamel for 30 s. Roughness measurements Ra, Rz and root mean square (RMS) and 3D images of enamel′s topography were obtained with atomic force microscopy (AFM), which is a powerful technique to obtain direct measurements on microscale features. Results and Conclusions: Roughness variables Ra, Rz and RMS presented statistically significant differences to all groups (P<0.000), with values increasing with etching time. This increase was greater from T0 to T15 than from T15 to T30. Enamel surface alterations T15 to T30 occur mainly due to increase in height and deepening of prisms central region.
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Erschienen in
-
Dental enamel roughness with different acid etching times: Atomic force microscopy study ; volume:1 ; number:03 ; year:2012 ; pages:187-191
European journal of general dentistry ; 1, Heft 03 (2012), 187-191
- Beteiligte Personen und Organisationen
-
Cerci, Bruno Bochnia
Roman, Lucimara Stolz
Guariza-Filho, Odilon
Camargo, Elisa Souza
Tanaka, Orlando Motohiro
- DOI
-
10.4103/2278-9626.105385
- URN
-
urn:nbn:de:101:1-2021121610541607039317
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:39 MESZ
Datenpartner
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Beteiligte
- Cerci, Bruno Bochnia
- Roman, Lucimara Stolz
- Guariza-Filho, Odilon
- Camargo, Elisa Souza
- Tanaka, Orlando Motohiro
Ähnliche Objekte (12)
Comparison of the Enamel Surface Roughness from Different Polishing Methods: Scanning Electron Microscopy and Atomic Force Microscopy Investigation
Automated measurement and analysis of sidewall roughness using three-dimensional atomic force microscopy
Atomic layer processing : semiconductor dry etching technology
Evaluating the Abrasivity of a Nanosized Eggshell–Titanium Dioxide on Tooth Enamel Using Atomic Force Microscopy
Influence of previous acid etching on interface morphology and bond strength of self-etching adhesive to cavosurface enamel
Atomic Force Microscopy (AFM)
Noncontact atomic force microscopy
Enabling control of matter at the atomic level: atomic layer deposition and fluorocarbon-based atomic layer etching
Scanning probe microscopy : atomic force microscopy and scanning tunneling microscopy
Impact of acid and laser etching of enamel on microleakage in different adhesive systems
Noncontact atomic force microscopy II
Amplitude modulation atomic force microscopy
Comparison of the Enamel Surface Roughness from Different Polishing Methods: Scanning Electron Microscopy and Atomic Force Microscopy Investigation
Automated measurement and analysis of sidewall roughness using three-dimensional atomic force microscopy
Atomic layer processing : semiconductor dry etching technology
Evaluating the Abrasivity of a Nanosized Eggshell–Titanium Dioxide on Tooth Enamel Using Atomic Force Microscopy
Influence of previous acid etching on interface morphology and bond strength of self-etching adhesive to cavosurface enamel
Atomic Force Microscopy (AFM)
Noncontact atomic force microscopy
Enabling control of matter at the atomic level: atomic layer deposition and fluorocarbon-based atomic layer etching
Scanning probe microscopy : atomic force microscopy and scanning tunneling microscopy
Impact of acid and laser etching of enamel on microleakage in different adhesive systems
Noncontact atomic force microscopy II
Amplitude modulation atomic force microscopy
Comparison of the Enamel Surface Roughness from Different Polishing Methods: Scanning Electron Microscopy and Atomic Force Microscopy Investigation
Automated measurement and analysis of sidewall roughness using three-dimensional atomic force microscopy
Atomic layer processing : semiconductor dry etching technology
Evaluating the Abrasivity of a Nanosized Eggshell–Titanium Dioxide on Tooth Enamel Using Atomic Force Microscopy
Influence of previous acid etching on interface morphology and bond strength of self-etching adhesive to cavosurface enamel
Atomic Force Microscopy (AFM)
Noncontact atomic force microscopy
Enabling control of matter at the atomic level: atomic layer deposition and fluorocarbon-based atomic layer etching
Scanning probe microscopy : atomic force microscopy and scanning tunneling microscopy
Impact of acid and laser etching of enamel on microleakage in different adhesive systems
Noncontact atomic force microscopy II