Hochschulschrift | Online-Publikation
Rational development of precursors for MOCVD of TiO2: precursor chemistry, thin film deposition, mechanistic studies
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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Bochum, Univ., Diss., 2005
- Classification
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Chemie
- Keyword
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MOCVD-Verfahren
Titandioxid
Dünne Schicht
Ausgangsmaterial
Titanalkoholate
Titandioxid
MOCVD-Verfahren
Präkursor
Dünne Schicht
Matrixisolation
- Creator
- URN
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urn:nbn:de:hbz:294-13604
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
15.08.2025, 7:22 AM CEST
Data provider
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
- Online-Publikation
Associated
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