Wall Microstructures of High Aspect Ratio Enabled by Near‐Field Electrospinning

Near‐field electrospinning (NFES) holds the potential to develop into a versatile additive nanomanufacturing platform. However, the impact of a variety of processing variables remains unresolved.Herein, the effect of solvents used to prepare suitable solutions for 3D microstructuring by electrospinning is studied. 3D straight walls of stacked fibers are fabricated using a layer‐by‐layer fiber deposition approach. The effect of the choice of substrate material is also explored. The results show that a high vapor pressure, and a low dielectric constant of the solvent, as well as a high substrate conductivity facilitate improved stacking of fiber layers. Utilizing these conditions, 3D stacked walls of polyethylene oxide are fabricated, and a maximum aspect ratio of 191.7 ± 52.6, while using a chromium/gold substrate and dichloromethane/methanol as the solvent is achieved.

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Wall Microstructures of High Aspect Ratio Enabled by Near‐Field Electrospinning ; day:19 ; month:03 ; year:2022 ; extent:9
Advanced engineering materials ; (19.03.2022) (gesamt 9)

Creator
Sadaf, Ahsana
Elter, Maximilian
Mager, Dario
Bunz, Uwe H. F.
Islam, Monsur
Korvink, Jan G.

DOI
10.1002/adem.202101740
URN
urn:nbn:de:101:1-2022032605391100925844
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:27 AM CEST

Data provider

This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.

Associated

Other Objects (12)