Stacked Lateral Gate-All-Around Metal–Oxide–Semiconductor Field-Effect Transistors and Their Three-Dimensional Integrated Circuits

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
1876-9918
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
Stacked Lateral Gate-All-Around Metal–Oxide–Semiconductor Field-Effect Transistors and Their Three-Dimensional Integrated Circuits ; day:29 ; month:10 ; year:2022 ; pages:1-12
Silicon ; (29.10.2022), 1-12

Classification
Elektrotechnik, Elektronik

Creator
Ye, Shujun
Liu, Liwei
Ma, Yuanxiao
Wang, Yeliang
Contributor
SpringerLink (Online service)

DOI
10.1007/s12633-022-02190-9
URN
urn:nbn:de:101:1-2023011408591164884282
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:22 AM CEST

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Associated

  • Ye, Shujun
  • Liu, Liwei
  • Ma, Yuanxiao
  • Wang, Yeliang
  • SpringerLink (Online service)

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