Low-Power Resistive Switching Characteristic in HfO2/TiOx Bi-Layer Resistive Random-Access Memory

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
1556-276X
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
Low-Power Resistive Switching Characteristic in HfO2/TiOx Bi-Layer Resistive Random-Access Memory ; volume:14 ; number:1 ; day:9 ; month:5 ; year:2019 ; pages:1-7 ; date:12.2019
Nanoscale research letters ; 14, Heft 1 (9.5.2019), 1-7, 12.2019

Creator
Ding, Xiangxiang
Feng, Yulin
Huang, Peng
Liu, Lifeng
Kang, Jinfeng
Contributor
SpringerLink (Online service)

DOI
10.1186/s11671-019-2956-4
URN
urn:nbn:de:101:1-2019090119435023387697
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:34 AM CEST

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Associated

  • Ding, Xiangxiang
  • Feng, Yulin
  • Huang, Peng
  • Liu, Lifeng
  • Kang, Jinfeng
  • SpringerLink (Online service)

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