Hochschulschrift
Profile simulations of plasma etching of silicon under consideration of charging effect and cryogenic condition
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Anmerkungen
-
Ilmenau, Technische Universität Ilmenau, Diss., 2014
- Klassifikation
-
Industrielle und handwerkliche Fertigung
- Ereignis
-
Veröffentlichung
- (wo)
-
Ilmenau
- (wer)
-
Universitätsbibliothek Ilmenau
- (wann)
-
2015
- Urheber
- Beteiligte Personen und Organisationen
- URN
-
urn:nbn:de:gbv:ilm1-2014000618
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:47 MEZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Objekttyp
- Hochschulschrift
Beteiligte
- Ishchuk, Valentyn
- Rangelow, Ivo W.
- Gerhard, Franz
- Olynick, Deirdre
- Universitätsbibliothek Ilmenau
Entstanden
- 2015
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