Hochschulschrift
Profile simulations of plasma etching of silicon under consideration of charging effect and cryogenic condition
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Notes
-
Ilmenau, Technische Universität Ilmenau, Diss., 2014
- Classification
-
Industrielle und handwerkliche Fertigung
- Event
-
Veröffentlichung
- (where)
-
Ilmenau
- (who)
-
Universitätsbibliothek Ilmenau
- (when)
-
2015
- Creator
- Contributor
- URN
-
urn:nbn:de:gbv:ilm1-2014000618
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
25.03.2025, 1:47 PM CET
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
- Ishchuk, Valentyn
- Rangelow, Ivo W.
- Gerhard, Franz
- Olynick, Deirdre
- Universitätsbibliothek Ilmenau
Time of origin
- 2015
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