Study on Mechanisms of Photon-Induced Material Removal on Silicon at Atomic and Close-to-Atomic Scale
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2520-8128
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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Study on Mechanisms of Photon-Induced Material Removal on Silicon at Atomic and Close-to-Atomic Scale ; volume:4 ; number:4 ; day:27 ; month:10 ; year:2021 ; pages:216-225 ; date:12.2021
Nanomanufacturing and metrology ; 4, Heft 4 (27.10.2021), 216-225, 12.2021
- Urheber
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Wang, Peizhi
Wang, Jinshi
Fang, Fengzhou
- Beteiligte Personen und Organisationen
-
SpringerLink (Online service)
- DOI
-
10.1007/s41871-021-00116-4
- URN
-
urn:nbn:de:101:1-2022020120160130281582
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:21 MESZ
Datenpartner
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Beteiligte
- Wang, Peizhi
- Wang, Jinshi
- Fang, Fengzhou
- SpringerLink (Online service)
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