Study on Mechanisms of Photon-Induced Material Removal on Silicon at Atomic and Close-to-Atomic Scale

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Location: Deutsche Nationalbibliothek Frankfurt am Main

ISSN: 2520-8128

Extent: Online-Ressource

Language: Englisch

Notes: online resource.

Bibliographic citation: Study on Mechanisms of Photon-Induced Material Removal on Silicon at Atomic and Close-to-Atomic Scale ; volume:4 ; number:4 ; day:27 ; month:10 ; year:2021 ; pages:216-225 ; date:12.2021
Nanomanufacturing and metrology ; 4, Heft 4 (27.10.2021), 216-225, 12.2021

Creator: Wang, Peizhi
Wang, Jinshi
Fang, Fengzhou

Contributor: SpringerLink (Online service)

DOI: 10.1007/s41871-021-00116-4

URN: urn:nbn:de:101:1-2022020120160130281582

Rights: Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 15.08.2025, 7:21 AM CEST

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Wang, Peizhi
Wang, Jinshi
Fang, Fengzhou
SpringerLink (Online service)

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Study on Mechanisms of Photon-Induced Material Removal on Silicon at Atomic and Close-to-Atomic Scale

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