Area‐Selective Growth of HfS2 Thin Films via Atomic Layer Deposition at Low Temperature
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
-
Englisch
- Erschienen in
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In: Advanced Materials Interfaces 7.23 (2020).
- Ereignis
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Veröffentlichung
- (wo)
-
Erlangen
- (wer)
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Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU)
- (wann)
-
2020
- Urheber
-
Cao, Yuanyuan
Wähler, Tobias
Park, Hyoungwon
Will, Johannes
Prihoda, Annemarie
Moses Badlyan, Narine
Fromm, Lukas
Yokosawa, Tadahiro
Wang, Bingzhe
Guldi, Dirk M.
Görling, Andreas
Maultzsch, Janina
Unruh, Tobias
Spiecker, Erdmann
Halik, Marcus
Libuda, Jörg
Bachmann, Julien
- DOI
-
10.1002/admi.202001493
- URN
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urn:nbn:de:bvb:29-opus4-151351
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:41 MEZ
Datenpartner
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Beteiligte
- Cao, Yuanyuan
- Wähler, Tobias
- Park, Hyoungwon
- Will, Johannes
- Prihoda, Annemarie
- Moses Badlyan, Narine
- Fromm, Lukas
- Yokosawa, Tadahiro
- Wang, Bingzhe
- Guldi, Dirk M.
- Görling, Andreas
- Maultzsch, Janina
- Unruh, Tobias
- Spiecker, Erdmann
- Halik, Marcus
- Libuda, Jörg
- Bachmann, Julien
- Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU)
Entstanden
- 2020
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