Area‐Selective Growth of HfS2 Thin Films via Atomic Layer Deposition at Low Temperature

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Location: Deutsche Nationalbibliothek Frankfurt am Main

Extent: Online-Ressource

Language: Englisch

Bibliographic citation: In: Advanced Materials Interfaces 7.23 (2020).

Event: Veröffentlichung

(where): Erlangen

(who): Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU)

(when): 2020

Creator: Cao, Yuanyuan
Wähler, Tobias
Park, Hyoungwon
Will, Johannes
Prihoda, Annemarie
Moses Badlyan, Narine
Fromm, Lukas
Yokosawa, Tadahiro
Wang, Bingzhe
Guldi, Dirk M.
Görling, Andreas
Maultzsch, Janina
Unruh, Tobias
Spiecker, Erdmann
Halik, Marcus
Libuda, Jörg
Bachmann, Julien

DOI: 10.1002/admi.202001493

URN: urn:nbn:de:bvb:29-opus4-151351

Rights: Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 25.03.2025, 1:41 PM CET

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Associated

Cao, Yuanyuan
Wähler, Tobias
Park, Hyoungwon
Will, Johannes
Prihoda, Annemarie
Moses Badlyan, Narine
Fromm, Lukas
Yokosawa, Tadahiro
Wang, Bingzhe
Guldi, Dirk M.
Görling, Andreas
Maultzsch, Janina
Unruh, Tobias
Spiecker, Erdmann
Halik, Marcus
Libuda, Jörg
Bachmann, Julien
Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU)

Time of origin

2020

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Area‐Selective Growth of HfS2 Thin Films via Atomic Layer Deposition at Low Temperature

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Other Objects (12)

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