Area‐Selective Growth of HfS 2 Thin Films via Atomic Layer Deposition at Low Temperature
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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Area‐Selective Growth of HfS 2 Thin Films via Atomic Layer Deposition at Low Temperature ; volume:7 ; number:23 ; year:2020 ; extent:9
Advanced materials interfaces ; 7, Heft 23 (2020) (gesamt 9)
- Creator
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Cao, Yuanyuan
Wähler, Tobias
Park, Hyoungwon
Will, Johannes
Prihoda, Annemarie
Moses Badlyan, Narine
Fromm, Lukas
Yokosawa, Tadahiro
Wang, Bingzhe
Guldi, Dirk M.
Görling, Andreas
Maultzsch, Janina
Unruh, Tobias
Spiecker, Erdmann
Halik, Marcus
Libuda, Jörg
Bachmann, Julien
- DOI
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10.1002/admi.202001493
- URN
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urn:nbn:de:101:1-2022052811100603909185
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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09.04.2009, 7:13 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Cao, Yuanyuan
- Wähler, Tobias
- Park, Hyoungwon
- Will, Johannes
- Prihoda, Annemarie
- Moses Badlyan, Narine
- Fromm, Lukas
- Yokosawa, Tadahiro
- Wang, Bingzhe
- Guldi, Dirk M.
- Görling, Andreas
- Maultzsch, Janina
- Unruh, Tobias
- Spiecker, Erdmann
- Halik, Marcus
- Libuda, Jörg
- Bachmann, Julien