Area‐Selective Growth of HfS 2 Thin Films via Atomic Layer Deposition at Low Temperature

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Area‐Selective Growth of HfS 2 Thin Films via Atomic Layer Deposition at Low Temperature ; volume:7 ; number:23 ; year:2020 ; extent:9
Advanced materials interfaces ; 7, Heft 23 (2020) (gesamt 9)

Creator
Cao, Yuanyuan
Wähler, Tobias
Park, Hyoungwon
Will, Johannes
Prihoda, Annemarie
Moses Badlyan, Narine
Fromm, Lukas
Yokosawa, Tadahiro
Wang, Bingzhe
Guldi, Dirk M.
Görling, Andreas
Maultzsch, Janina
Unruh, Tobias
Spiecker, Erdmann
Halik, Marcus
Libuda, Jörg
Bachmann, Julien

DOI
10.1002/admi.202001493
URN
urn:nbn:de:101:1-2022052811100603909185
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
09.04.2009, 7:13 AM CEST

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