Aufsatzsammlung

Predictive simulation of semiconductor processing : status and challenges

Predictive simulation of semiconductor processingenables researchers and developersto extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool. TOC:Transistors and Atoms.- Atomistic Simulations of Processes at Surfaces.- Atomistic Simulations in Materials Processing.- Atomistic Simulation of Decanano MOSFETs.- Modeling and Simulation of Heterojunction Bipolar Transistors.- Gate Oxide Reliability: Physical and Computational Models.- High-K Dielectrics: The Example of Pr2O3.- Atomistic Simulation of Si3N4 CVD from Dichlorosilane and NH3.- Interconnects and Propagation of High Frequency Signals.- Modeling of Electromigration in Interconnects.- Predictive Modeling of Transition Metal Gathering: Applications and Materials Science Challenges.

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISBN
9783540204817
3540204814
Dimensions
24 cm
Extent
XVII, 490 S.
Language
Englisch
Notes
Ill., graph. Darst.
Literaturangaben

Bibliographic citation
Springer series in materials science ; 72

Classification
Ingenieurwissenschaften und Maschinenbau
Physik
Keyword
Transistor
Atomare Bewegung
Computersimulation
Halbleitertechnologie
Prozesssimulation

Event
Veröffentlichung
(where)
Berlin, Heidelberg, New York, Hong Kong, London, Milan, Paris, Tokyo
(who)
Springer
(when)
2004
Contributor
Dabrowski, Jarek

Table of contents
Rights
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Last update
11.03.2025, 12:06 PM CET

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Object type

  • Aufsatzsammlung

Associated

  • Dabrowski, Jarek
  • Springer

Time of origin

  • 2004

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