Silver Metallization with Controlled Etch Stop Using SiO x Layers in Passivating Contacts for Improved Silicon Solar Cell Performance
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
Silver Metallization with Controlled Etch Stop Using SiO x Layers in Passivating Contacts for Improved Silicon Solar Cell Performance ; day:12 ; month:09 ; year:2023 ; extent:9
Solar RRL ; (12.09.2023) (gesamt 9)
- Creator
-
Glatthaar, Raphael
Schmidt, Franz-Philipp
Hammud, Adnan
Lunkenbein, Thomas
Okker, Tobias
Huster, Frank
Seren, Sven
Cela Greven, Beatriz
Hahn, Giso
Terheiden, Barbara
- DOI
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10.1002/solr.202300491
- URN
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urn:nbn:de:101:1-2023091315330039654017
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
14.08.2025, 10:52 AM CEST
Data provider
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Associated
- Glatthaar, Raphael
- Schmidt, Franz-Philipp
- Hammud, Adnan
- Lunkenbein, Thomas
- Okker, Tobias
- Huster, Frank
- Seren, Sven
- Cela Greven, Beatriz
- Hahn, Giso
- Terheiden, Barbara
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Role of thermal SiO<sub>2</sub> on passivation of highly doped layer
Investigation of radiation damage to the Al2O3
RF-Sputtered Ti-Based Dielectric Layers as Al-Diffusion Barrier for Passivating Contacts
Correlation of stress in silicon nitride layers with their complete removal by laser ablation
Bias-plasma Assisted RF Magnetron Sputter Deposition of Hydrogen-less Amorphous Silicon
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Diffusion-based model of local Al back surface field formation for industrial passivated emitter and rear cell solar cells
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Passivation of Si wafers by Al2O3 films with different surface conditioning
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Investigation of radiation damage to the Al2O3
RF-Sputtered Ti-Based Dielectric Layers as Al-Diffusion Barrier for Passivating Contacts
Correlation of stress in silicon nitride layers with their complete removal by laser ablation
Bias-plasma Assisted RF Magnetron Sputter Deposition of Hydrogen-less Amorphous Silicon
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