Electromigration induced resistance changes in passivated aluminum thin film conductors
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Anmerkungen
-
In: Materials reliability in microelectronics III : symposium held April 12 - 15, 1993, San Francisco, California, U.S.A. / ed.: Kenneth P. Rodbell .... - Pittsburgh, Pa. : Materials Research Soc., 1993. - (Materials Research Society symposium proceedings ; 309), S. 301-306
- Klassifikation
-
Ingenieurwissenschaften und Maschinenbau
- Schlagwort
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Passivierung ; Elektromigration ; Aluminium ; Resistenz
- Ereignis
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Veröffentlichung
- (wo)
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Saarbrücken
- (wer)
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Saarländische Universitäts- und Landesbibliothek
- (wann)
-
2008
- Urheber
- URN
-
urn:nbn:de:bsz:291-scidok-17947
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:52 MEZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Beteiligte
- Möckl, U. E.
- Lloyd, J. R.
- Arzt, Eduard
- Saarländische Universitäts- und Landesbibliothek
Entstanden
- 2008
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