Electromigration induced resistance changes in passivated aluminum thin film conductors
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Notes
-
In: Materials reliability in microelectronics III : symposium held April 12 - 15, 1993, San Francisco, California, U.S.A. / ed.: Kenneth P. Rodbell .... - Pittsburgh, Pa. : Materials Research Soc., 1993. - (Materials Research Society symposium proceedings ; 309), S. 301-306
- Classification
-
Ingenieurwissenschaften und Maschinenbau
- Keyword
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Passivierung ; Elektromigration ; Aluminium ; Resistenz
- Event
-
Veröffentlichung
- (where)
-
Saarbrücken
- (who)
-
Saarländische Universitäts- und Landesbibliothek
- (when)
-
2008
- Creator
- URN
-
urn:nbn:de:bsz:291-scidok-17947
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
25.03.2025, 1:52 PM CET
Data provider
This object is provided by:
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Möckl, U. E.
- Lloyd, J. R.
- Arzt, Eduard
- Saarländische Universitäts- und Landesbibliothek
Time of origin
- 2008
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