Reliable metal–graphene contact formation process flows in a CMOS-compatible environment
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Erschienen in
-
In: Nanoscale Advances, 4, S. 4373-4380
- Klassifikation
-
Elektrotechnik, Elektronik
- Ereignis
-
Veröffentlichung
- (wo)
-
Wildau
- (wer)
-
Technische Hochschule Wildau
- (wann)
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2022
- Urheber
-
Elviretti, M.
Lisker, Marco
Lukose, R.
Lukosius, M.
Akhtar, Fatima
Mai, Andreas
- URN
-
urn:nbn:de:kobv:526-opus4-16581
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:50 MEZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Beteiligte
- Elviretti, M.
- Lisker, Marco
- Lukose, R.
- Lukosius, M.
- Akhtar, Fatima
- Mai, Andreas
- Technische Hochschule Wildau
Entstanden
- 2022
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