Reliable metal–graphene contact formation process flows in a CMOS-compatible environment
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
In: Nanoscale Advances, 4, S. 4373-4380
- Classification
-
Elektrotechnik, Elektronik
- Event
-
Veröffentlichung
- (where)
-
Wildau
- (who)
-
Technische Hochschule Wildau
- (when)
-
2022
- Creator
-
Elviretti, M.
Lisker, Marco
Lukose, R.
Lukosius, M.
Akhtar, Fatima
Mai, Andreas
- URN
-
urn:nbn:de:kobv:526-opus4-16581
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
25.03.2025, 1:50 PM CET
Data provider
This object is provided by:
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Elviretti, M.
- Lisker, Marco
- Lukose, R.
- Lukosius, M.
- Akhtar, Fatima
- Mai, Andreas
- Technische Hochschule Wildau
Time of origin
- 2022
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Design of a fully CMOS compatible Mechanical Stress Sensor
Flexible and three-dimensional CMOS-compatible intracerebral neural probes
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Reliable lift-off patterning of graphene dispersions for humidity sensors
CMOS-compatible measures for thermal management of phase-sensitive silicon photonic systems
Development of a Post-CMOS Compatible Nanoporous Thin Film layer Based on Al2O3
Contact resistance Study of "edge-contacted" metal-graphene interfaces
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