Hochschulschrift
Low temperature surface passivation of crystalline silicon and its application to the rear side of solar cells
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Anmerkungen
-
Hannover, Univ., Diss., 2004
- Klassifikation
-
Ingenieurwissenschaften und Maschinenbau
- Schlagwort
-
Halbleiteroberfläche
Rekombination
Silicium
Polykristall
Passivschicht
PECVD-Verfahren
Solarzelle
Silicium
Rückseite
Passivierung
Niedrigtemperatur
Wirkungsgrad
- Urheber
- URN
-
urn:nbn:de:gbv:089-3808016633
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:23 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Objekttyp
- Hochschulschrift
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